Publications OK SMART LAB

Method of forming aligned pattern in pattern formation region by using imprint process
Authors
Sunghoon Lee, Dongouk Kim, Joonyong Park, Jihyun Bae, Bongsu Shin, Jaeseung Chung, Sukgyu Hahm, Jong G. Ok, Ilwun Yoon
Journal
US patent
Vol
granted; US 9855703 B2
Year
Patents
granted on Jan 2, 2018.