A nanochannel-guided lithography technique is developed that achieves continuous fabrication of higher aspect-ratio nanograting structures by adopting a cross-linkable liquid resist coating. Under the guidance of nanochannels in the grating mold, the UV-curable liquid resist is smoothly extruded and self-stabilized along the slightly inscribed solid substrate, dictated by the resist wettability to the substrate as well as the substrate topography.