A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo–roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask–substrate motions.